# ISO 10110 – technical drawing meanings

Here are some of the ISO 10110 symbols and codes used in common software to produce technical product drawings,
With these symbols and codes, it becomes much easier for basic learners of optics to understand the drawings.

R: radius of curvature. CC means concave and CX means convex.

Ø : Diameter.

Øe: Effective diameter.

n: refractive index.

v: Abbe number.

(λ) : film layer specification.

P;Rq;Lmin;Lmax: indicates the polished surface in the drawing.  Details of the finish specifications will not be provided in the drawings, but they will be specified in the surface data.

Rq (μm) = Allowable maximun RMS surface roughness.

Lmin/Lmax (mm) = Minimum and maximum length of sampling interval when calculating RMS.

0/A: Stress birefringence.

A (nm/cm) = maximum optical path difference.

1/NxA: Bubbles and impurities.

N = the number of bubbles and/or impurities;

A = Bubble class number (size).

2/A;  B: Inhomogeneity and streaking.

A = evenness class number;

B = fringe class number.

3/A(B/C) or 3/A(B/C)RMS＜D or 3/-RMSx＜D, (x is t, i, or a):

Surface Figure Tolerance.

A= maximum arc error (in aperture).

B = peak-valley value of irregularity (in aperture).  C = aspherical rotation symmetry error (in aperture).

If (B/C) is replaced by A(B), no tolerance is specified.

For RMS tolerance,

D = maximum RMS error (in apertures),

t = total RMS error from nominal value;

I = RMS irregularity,

a = RMS asymmetry left after the irregularity subtracted from the asphericity.

4/S(L) : center tolerance.

S = the dip Angle (in arcs) of the surface;

L = lateral deviation.

5/NxA; CN “xA”; LN “xA”; EA “‘ :

Surface blemish method.

N = defect number;

A = grade number (square root of defect area);

C = name of membrane defect;

N ‘= number of membrane defect;

E = name of edge notch;

A “‘ = edge protrusion;

L = name of long scratch;

N” = number of scratch;

A “= Grade number (scratch width (mm)).

6/Hth; L; pdg; fp; nts x np or 6/Eth; L; nts:

Hth = energy density threshold;

L = laser wavelength (nm);

pdg = pulse time width;

fp = pulse repetition frequency (Hz);

nts = number of test points;

np = number of pulses at each test point;

Eth = power density threshold (in watt-cm^2). 